Inductively coupled plasmas reactors with a capacitively coupled RF bias (ICP/CCP reactors) are notoriously difficult to model. The main difficulties are inherited from the modeling of the capacitively coupled component of the problem. The capacitive coupled part is discussed in Capacitively Coupled Plasmas and it is advised to be familiar with this part of the problem first. The inductive part is easy to solve and is discussed in Theory for Inductively Coupled Plasmas.

To model ICP/CCP reactors COMSOL Multiphysics has a dedicated interface called Inductive Coupled Plasma with RF Bias which couples the Plasma, Time Periodic and the Magnetic Fields interfaces. The main difference when comparing with the Inductive Coupled Plasma is that the Plasma interface is replaced by the Plasma, Time Periodic interface. The capacitively coupled excitation is applied in the context of the Plasma, Time Periodic interface and consequently a periodic steady-state solution is solved directly. The inductively coupled part of the excitation (normally provided by a coil) is solved by the Magnetic Fields interface in the frequency domain.