Results
Create a duplicate Solution dataset with a selection so that you can see inside the vacuum chamber.
Datasets
1
In the Model Builder expand the Results > Datasets node.
2
Right-click Study 1/Parametric Solutions 1 (sol2)  and choose Duplicate .
3
Right-click Study 1/Parametric Solutions 1 (3) (sol2) and choose Selection .
4
In the Settings window for Selection locate the Geometric Entity Selection section. From the Geometric entity level list, choose Boundary.
5
From the Selection list, choose Postprocessing.
Incident Molecular Flux (fmf)
Update the default plots to use the new dataset.
1
In the Model Builder under Results, click Incident Molecular Flux (fmf) .
2
In the Settings window for 3D Plot Group locate the Data section. From the Dataset list, choose Study 1/Parametric Solutions 1 (3) (sol2).
Number Density (fmf)
1
In the Model Builder under Results, click Total Number Density (fmf) .
2
In the Settings window for 3D Plot Group locate the Data section. From the Dataset list, choose Study 1/Parametric Solutions 1 (3) (sol2).
Pressure (fmf)
1
In the Model Builder under Results, click Total Pressure (fmf) .
2
In the Settings window for 3D Plot Group locate the Data section. From the Dataset list, choose Study 1/Parametric Solutions 1 (3) (sol2).
Number Density (fmf)
1
In the Model Builder under Results, click Total Number Density (fmf) .
2
In the Settings window for 3D Plot Group locate the Data section. From the Parameter value (theta) list, choose 0.
3
Click the Plot  button.
4
Repeat these steps but this time select an angle of 40 degrees.
The shadowing effect of the wafer support is evident at both wafer angles. It is also clear that more flux enters the beam line when the wafer normal is parallel to the beam. This is because the angular distribution of diffusely emitted flux is maximal parallel to the wafer normal.
1D Plot Group 4
Create a plot of the number density along the beam path.
1
In the Home toolbar click Add Plot Group and choose 1D Plot Group .
2
In the Settings window for 1D Plot Group locate the Data section. From the Dataset list, choose Study 1/Parametric Solutions 1 (2) (sol2).
3
Locate the Legend section. From the Position list, choose Lower right.
4
On the 1D Plot Group toolbar click Line Graph .
5
From the Selection list, choose Work Plane 1.
6
In the Settings window for Line Graph click Replace Expression in the upper-right corner of the y-Axis Data section. From the menu, choose Model > Component 1 > Free Molecular Flow > Number density > fmf.ntot—Total number density.
7
Click to expand the Legends section. Select the Show legends checkbox.
8
Click to expand the Quality section. From the Resolution list, choose No refinement.
9
Click the Plot button .
The number density increases along the beam path toward the wafer, with strong changes in gradient as the beam passes through different apertures. Note that, in the immediate vicinity of the wafer, the number density is not computed accurately (this is difficult to see from the plot above, but zooming into the plot at the end of the beam makes it more apparent). This is a result of numerical issues when computing the number density very close to a source surface within the domain.
1D Plot Group 5
Finally, plot the mean number density along the beam line, as a function of wafer angle. This quantity can be used as figure of merit for the system design.
1
In the Home toolbar click Add Plot Group  and choose 1D Plot Group .
2
In the Settings window for 1D Plot Group locate the Data section. From the Dataset list, choose Study 1/Parametric Solutions 1 (2) (sol2).
3
Locate the Plot Settings section.
-
Select the x-axis label checkbox. In the associated text field, type Angle between beam and wafer (deg).
-
Select the y-axis label checkbox. In the associated text field, type Average number density (1/m<sup>3</sup>).
4
On the 1D Plot Group toolbar click Global .
5
In the Settings window for Global locate the y-Axis Data section. In the table, enter the following settings:
Expression
Unit
Description
aveop1(fmf.ntot)
1/(m^3)
Mean number density
6
Locate the x-Axis Data section.
-
From the Parameter list, choose Expression.
-
In the Expression text field, type theta.
7
On the 1D Plot Group toolbar click Plot .
The average flux in the corrector is reduced by rotating the wafer normal away from the beam line with nearly a 10% reduction occurring over the full angular range. Rotating the wafer in this manner can therefore result in improved performance of the implanter.