References for the Charged Particle Tracing Interface
1.
NIST Stopping-Power and Range Tables for Electrons, Protons, and Helium Ions,
http://www.nist.gov/pml/data/star/index.cfm
.
2.
International Geomagnetic Reference Field (IGRF),
http://www.ngdc.noaa.gov/IAGA/vmod/igrf.html
.
3.
Z. Ristivojevic and Z.L. Petrovic. “A Monte Carlo simulation of ion transport at finite temperatures.”
Plasma Sources Science and Technology
, vol. 21, no. 3, 035001, 12 pp, 2012.
4.
H.R. Skullerud, “The stochastic computer simulation of ion motion in a gas subjected to a constant electric field.”
Journal of Physics D: Applied Physics
, vol. 1, no. 11, pp. 1567-1568, 1968.
5.
K. Nanbu, “Probability theory of electron-molecule, ion-molecule, molecule-molecule, and Coulomb collisions for particle modeling of materials processing plasmas and cases.”
IEEE Transactions on plasma science
, vol. 28, no. 3, pp. 971-990, 2000.
6.
L.D. Landau and E.M. Lifshitz,
Mechanics
, 3rd ed., Elsevier, 1976.
7.
J.F. Ziegler, J.P. Biersack, and M. D. Ziegler,
The Stopping and Range of Ions and Matter
, SRIM, 2015.
8.
S. Humphries,
Charged Particle Beams
, Dover, 2013.
9.
S.M. Lund, T. Kikuchi, R. C. Davidson, “Generation of initial Vlasov distributions for simulation of charged particle beams with high space-charge intensity”,
Physical Review Special Topics — Accelerators and Beams
, 2007.
10.
P.T. Kirstein, G. S. Kino, and W. E. Waters,
Space charge flow
, McGraw-Hill, 1967.
11.
Y. Yin and H.H. Sawin, “Surface Roughening of Silicon, Thermal Silicon Dioxide, and Low-k Dielectric Coral Films in Argon Plasma”,
J. Vac. Sci. Technol. A
, vol. 26, no. 1, pp. 151–160, 2008.
12.
W. Guo and H.H. Sawin, “Modeling of the Angular Dependence of Plasma Etching”,
J. Vac. Sci. Technol. A
, vol. 27, no. 6, pp. 1326–1336, 2009.